The Sycon EBS-530 Electron Beam Sweep Control generates a large number of precision sweep patterns for use with electron beam deposition sources. The user may select from the basic shapes (Circle, Figure-8, Line and Point) provided, or create user-defined patterns to optimize deposition control of metals and dielectric materials. Variations on the basic shapes can be created by applying the provided pattern modifiers. Pattern modifiers provided include power, sweep frequency, rotational speed and power profile.
Selecting or programming these sweep patterns is easily accomplished through the user-friendly front-panel touch screen LCD display. Up to 32 different sweep patterns can be stored within the unit. These different patterns can easily be selected from the front panel, remotely through back-panel remote input, or through the standard RS-232/RS-485 interface.
Starting with a fixed set of basic sweep patterns that are embedded in the Sweep Control, the user can design E-beam sweep patterns that are ideally suited to the characteristics of the source and deposition materials. The sweep patterns generated within the unit produce dual current outputs which can drive the X and Y sweep coils of most electron beam deposition sources.
The EBS-530 provides a calibration function to compensate for differences between types and brands of e-beam guns and provide optimum heating of the deposition material.
