The MKS SEMOZON® AX8555 Ozone Delivery Subsystem supports multiple chambers or tools to provide ultraclean, high concentration ozone gas using the SEMOZON AX8560 Ozone Delivery Subsystem. The MKS SEMOZON AX8555 is also a fully integrated, high output ozone gas delivery system specifically designed for advanced semiconductor process applications such as Atomic Layer Deposition (ALD). ALD is a self-limiting “pulsed” process that sequentially introduces reactants into the process chamber in the gas phase to build successive monolayers of film on the wafer. By appropriately selecting the precursor materials, parameters such as growth rate, reaction temperature, impurity levels, and crystallinity of the deposited films can be influenced. Films grown using ozone as an oxidizer in ALD are very high quality, stoichiometric, uniform, dense and free from any significant contamination.
