Today's advanced sputtering processes require speed, control, accuracy, improved reliability and sophisticated arc management. Building on the production-proven DCG series, the Optima® is the next generation of MKS high performance DC Plasma power supply systems for Physical Vapor Deposition (PVD) processes.
Single 10kW output as well as dual 5kW output are available. Process reliability and performance are provided by a variety of output regulation modes, user-adjustable settings and control options.
MKS Optima® DC generators meet the demanding power requirements for a variety of thin film applications including; semiconductor, data storage, solar cell and industrial coatings.
Features & Benefits
- DSP-Based Control
- ±0.1% Linearity and Accuracy
- <4mJ Micro Arc Energy
- 3U Rack Height
- Forced Air Cooling
- Interface Flexibility
- Multiple Run Modes Enabling
- Higher Yields
- Flexible Operation
