Today's advanced sputtering processes require speed, control, accuracy, improved reliability and sophisticated arc management. Building on the production-proven DCG series, the Optima® is the next generation of MKS high performance DC Plasma power supply systems for Physical Vapor Deposition (PVD) processes.
The design is compact and scalable, enabling power levels from 20kW to 100kW. The higher powers are attained by linking 20kW slave units to a 20kW master. Process reliability and performance are provided by a variety of output regulation modes, useradjustable settings and control options.
MKS Optima® DC generators meet the demanding power requirements for a variety of thin film applications including; semiconductor, data storage, solar cell and industrial coatings.
Features & Benefits
- DSP-Based Control
- ±0.1% Linearity and Accuracy
- <4mJ Micro Arc Energy
- 3U Rack Height
- Forced Air Cooling
- Interface Flexibility
- Multiple Run Modes
