Today's advanced sputtering processes require speed, control, accuracy, improved reliability and sophisticated arc management. Building on the production-proven DCG series, the Optima® is the next generation of MKS high performance DC Plasma power supply systems for Physical Vapor Deposition (PVD) processes.
The design is compact and scalable with 40kW enabled by linking a 20kW Slave to a 20kW Master. Process reliability and performance are provided by a variety of output regulation modes, user-adjustable settings and control options.
MKS Optima® DC generators meet the demanding power requirements for a variety of thin film applications including; semiconductor, data storage, solar cell and industrial coatings.
Features & Benefits
- DSP-Based Control
- ±0.1% Linearity and Accuracy
- <4mJ Micro Arc Energy
- 3U Rack Height per 20kW unit
- Forced Air Cooling
- Interface Flexibility
- Multiple Run Modes
