Today's advanced sputtering processes require speed, control, accuracy, improved reliability and sophisticated arc management. Building on the production-proven DCG series, the Optima® is the next generation of MKS high performance DC Plasma power supply systems for Physical Vapor Deposition (PVD) processes.
Process reliability and performance are provided by a variety of output regulation modes, user-adjustable settings and control options. Various impedance ranges are possible. MKS Optima® DC generators meet the demanding power requirements for a variety of thin film applications including; semiconductor, data storage, solar cell and industrial coatings.
Features & Benefits:
- DSP-Based Control
- ±0.1% Linearity and Accuracy
- 3U Rack Height
- Forced Air Cooling
- Interface Flexibility
- Multiple Run Modes
- Enabling
- Higher Yields
- Flexible Operation
